Ion chambers for semiconductor equipment

The manufacturing of semiconductor devices relies on the possibility to dope the material with specific atoms by ion implantation equipment. The generation of ions require hign temperatures and reactive gasses, only few materials such as tungsten can assure mechanical, chemical and thermal resilience in such harsh process conditions.

Since over 15 years, Spectra-Mat has been machining ion chambers out of 15% porous tungsten, whose extremely high purity raw material guarantees no impuritues contamination in the process gasses. The unique capabilities to machine porous tungsten are used to supply machined ion chamber, arc slits, repellers and pins for ion implantation equipment.

  • Excellent high temperature resistance, hardness and thermal conductivity.
  • No outgassing
  • Resistant to corrosion by several minerals acids, high reactive gasses and liquied metals.
  • High purity materials
  • High tolerance machined parts
  • Proven long life in highly reactive plasma environment.

The strict final visual and dimensional inspection together with clean room final packaging guarantee consistent high quality of the parts for semiconductor equipment.

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